Intervia 2011 Remover

Intervia 2011 Remover is a mixture of pure organic solvents specifically formulated to remove all Microposit, Megaposit, and Intervia Photoresists. It is particularly recommended for use in applications where the photoresist has seen high temperatures, strong etchants, or other harsh processing conditions.

Product Features

  • Extended Bath Life
  • Substrate Compatibility
  • Ease of Operation
  • Environmental and Health Advantages

Link to Dow Intervia 2011 Remover


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