CHROME/Clean AC-1
CHROME/Clean is a concentrated, non-etching, free-rinsing acid cleaner designed specifically to remove chromate and zincate anti-tarnish costings from copper foil. [Read More]
CHROME/Clean is a concentrated, non-etching, free-rinsing acid cleaner designed specifically to remove chromate and zincate anti-tarnish costings from copper foil. [Read More]
CHROME/Clean is a concentrated, non-etching, free-rinsing acid cleaner designed specifically to remove chromate and zincate anti-tarnish costings from copper foil. [Read More]
PC-450 is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable [Read More]
PC-450 is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable [Read More]
PC-640C is a carbonate based, liquid developer concentrate formulated with an advanced cleaner package for developing fully or semi aqueous [Read More]
Cu/ETCH ME-45 is a highly stable, easy to operate copper microetchant. It is an excellent micro etch for use prior [Read More]
RE/Gen CC-40 is a concentrated, stabilized, and buffered sodium chlorate solution designed to economically and safely regenerate cupric chloride etching [Read More]
RE/Gen CC-45 is a concentrated, buffered sodium chlorate solution designed to economically and safely regenerate cupric chloride etching systems. The [Read More]
EQUIPMENT/Cleaner 20 is a highly concentrated detergent designed specifically to remove chemical scale, hard water scale, dry film and LPISM [Read More]
EQUIPMENT/Cleaner 60 is a concentrated acid cleaner designed for use in developers, resist strippers and other processing tanks. EQUIPMENT/Cleaner 60 [Read More]
EQUIPMENT/Cleaner 70 is a concentrated acid cleaner designed for use in developers, resist strippers and other processing tanks. EQUIPMENT/Cleaner 70 [Read More]
ENVIRO/Flow HAL-30 (HAL-30) is a low – medium viscosity hot air solder leveling flux designed to assure rapid and complete [Read More]
Cu/SCRUB 4F-9.1 is an acidified pumice scrub designed to promote cleaning and micro-roughening of copper laminate. Cu/SCRUB 4F-9.1 is formulated [Read More]
POLY/Solv RS-30 (RS-30) is a concentrated solution designed to economically and efficiently strip all commercially available, fully aqueous dry film [Read More]
POLY/Solv RS-40 (RS-40) is a concentrated, monothanolamine based solution designed to economically and efficiently strip all commercially available, fully aqueous [Read More]
POLY/Solv RS-50 (RS-50) is a concentrated solution designed to economically and efficiently strip all commercially available, fully aqueous dry film [Read More]
POLY/Solv RS-60 (RS-60) is a concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry film [Read More]
POLY/Solv RS-70 (RS-70) is a highly concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry [Read More]
POLY/Solv RS-80 (RS-80) is a highly concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry [Read More]
POLY/Solv RS-720 (RS-720) is a highly concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry [Read More]
POLY/Solv RS-740 (RS-740) is a highly concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry [Read More]